Corial ICP/RIE system
Dry etching of Si, SiO2 and Si3N4
The Corial ICP/RIE System is a system used for etching and preparing samples in semiconductor technology, nanotechnology, and materials engineering laboratories. The system includes two main technologies: ICP (Inductively Coupled Plasma) and RIE (Reactive Ion Etching).ICP is a technology that uses an inductive magnetic field to create a hot plasma, providing high energy to particles during the process. It allows for precise removal of materials via plasma and is especially effective for applications requiring highly accurate etching on thin layers of material.RIE is a technology that combines plasma use with reactive ions, intended for etching or processing materials by exposing them to controlled chemical components. RIE enables localized etching with precise control over the shape and thickness of the processed materials.
Corial | Site
Edmond J. Safra (Givat-Ram)
Nano Center
Contacts
- Golan Tanami
- golant@savion.huji.ac.il